Pulsed laser deposition of thin carbon films in a neutral gas background

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dc.contributor.authorGuzman, F.
dc.contributor.authorFavre, M.
dc.contributor.authorRuiz, H. M.
dc.contributor.authorHevia, S.
dc.contributor.authorCaballero, L. S.
dc.contributor.authorWyndham, E. S.
dc.contributor.authorBhuyan, H.
dc.contributor.authorFlores, M.
dc.contributor.authorMaendl, S.
dc.date.accessioned2025-01-24T00:04:03Z
dc.date.available2025-01-24T00:04:03Z
dc.date.issued2013
dc.description.abstractWe studied carbon film deposition using a laser-produced plasma, in argon and helium background gas, at pressures between 0.5 and 700 mTorr. A Nd : YAG, 370 mJ, 3.5 ns, at 1.06 mu m, operating at 10 Hz, with a fluence of 6.7 J cm(-2) was used. The laser plasma was characterized using space resolved OES and a fast response Faraday cup. The resulting carbon films were analysed using AFM, Raman spectroscopy, XPS and SIMS. The structural properties of the carbon films were found to be strongly correlated with the laser carbon plasma composition. Films with a relatively high content of sp(3), characteristic of DLC, were obtained at pressures below 200 mTorr. For these conditions the characteristic carbon ion energies in the expanding laser plasma were of the order of 100 eV. At higher pressures sp(2) bonds, associated with amorphous carbon, were dominant, which coincides with a high content of C-2 molecules in the laser plasma, and a characteristic carbon ion energy around 20 eV.
dc.fuente.origenWOS
dc.identifier.doi10.1088/0022-3727/46/21/215202
dc.identifier.eissn1361-6463
dc.identifier.issn0022-3727
dc.identifier.urihttps://doi.org/10.1088/0022-3727/46/21/215202
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/101781
dc.identifier.wosidWOS:000319116300006
dc.issue.numero21
dc.language.isoen
dc.revistaJournal of physics d-applied physics
dc.rightsacceso restringido
dc.titlePulsed laser deposition of thin carbon films in a neutral gas background
dc.typeartículo
dc.volumen46
sipa.indexWOS
sipa.trazabilidadWOS;2025-01-12
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