Effect of annealing and UV-radiation time over micropore architecture of self-assembled block copolymer thin film

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dc.contributor.authorSarabia Vallejos, Mauricio
dc.date.accessioned2016-05-10T18:06:11Z
dc.date.available2016-05-10T18:06:11Z
dc.date.issued2015
dc.identifier.issn1788-618X
dc.identifier.urihttps://repositorio.uc.cl/handle/11534/12737
dc.language.isoen
dc.relation.isformatofExpress Polymer Letters No. 6 (9), p. 525-535.
dc.revistaEXPRESS POLYMER LETTERSes_ES
dc.rightsacceso restringido
dc.subject.ddc510
dc.subject.deweyMatemática física y químicaes_ES
dc.subject.otherPolimerizaciónes_ES
dc.subject.otherIrradiaciónes_ES
dc.subject.otherEspectroscopía de Ramanes_ES
dc.titleEffect of annealing and UV-radiation time over micropore architecture of self-assembled block copolymer thin filmes_ES
dc.typeartículo
sipa.codpersvinculados170370
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